倒置PNP管实现耐高反向电压的高端理想二极管设计
集成电路应用
陈石平,钱英军,朱冠良
广东科贸职业学院智能制造学院
摘要: 由于高端理想二极管的MOS管栅源极和BJT管发射结耐反向电压能力较弱,外接高反向电压时可能被击穿,为解决此问题,该设计针对“PMOS主管+PNP对管”等技术方案进行改进,采用稳压二极管和倒置工作状态的BJT管,研发出具备耐高反向电压特性的高端理想二极管。该电路由PMOS主管、比较器、保护电路等构成,稳压二极管用于保护PMOS主管栅源极,比较器前端的PNP辅管V2被设计为倒置工作状态用于保护其发射结,改进后的电路等效为高端理想二极管。经过对两种技术方案电路原理分析与软件仿真验证,结果表明,两种方案均具备防止电流倒灌的功能,而该设计改进的电路结构简洁,可承受更高的反向击穿电压,且仅需增加少量物料成本,实用性较强。
中图分类号:TN710.2文献标识码:ADOI:10.19339/j.issn.1674-2583.2026.02.005
中文引用格式:陈石平,钱英军,朱冠良. 倒置PNP管实现耐高反向电压的高端理想二极管设计[J].集成电路应用,2026,43(2):23-28.
英文引用格式:Chen Shiping,Qian Yingjun,Zhu Guanliang. High-side ideal diode design on high reverse voltage tolerance with reverse PNP transistor [J].Application of IC,2026,43(2):23-28.
中文引用格式:陈石平,钱英军,朱冠良. 倒置PNP管实现耐高反向电压的高端理想二极管设计[J].集成电路应用,2026,43(2):23-28.
英文引用格式:Chen Shiping,Qian Yingjun,Zhu Guanliang. High-side ideal diode design on high reverse voltage tolerance with reverse PNP transistor [J].Application of IC,2026,43(2):23-28.
High-side ideal diode design on high reverse voltage tolerance with reverse PNP transistor
Chen Shiping,Qian Yingjun,Zhu Guanliang
Guangdong Polytechnic of Science and Trade,School of Intelligent Manufacturing
Abstract: In view of the weak reverse voltage resistance of the gate-source of MOS tube and the emitter junction of BJT tube in high-side ideal diodes, they may be broken down when an external high reverse voltage is applied. To solve this problem, this design improves the technical solutions such as the main PMOS tube plus PNP paired tubes, adopts a zener diode and a BJT tube working in an inverted state, and develops a high-side ideal diode with high reverse voltage resistance. The circuit is composed of a main PMOS tube, a comparator, a protection circuit, etc. The zener diode is used to protect the gate-source of the main PMOS tube, and the auxiliary PNP tube V2 at the front end of the comparator is designed to work in an inverted state to protect its emitter junction. The improved circuit is equivalent to a high-side ideal diode. Through the circuit principle analysis and software simulation verification of the two technical schemes, the results show that both schemes have the function of preventing reverse current. The improved circuit proposed in this design has a simple structure, can withstand higher reverse breakdown voltage, only requiring a small increase in material cost with strong practicability.
Key words : high-side ideal diode;reverse state; reverse breakdown voltage; transistor pair
引言
二极管因具备单向导通特性,其耐高反向电压能力强,反向电流小,拥有良好的防倒灌功能[1-2]。肖特基二极管串联于电源输出端时,压降较小,但耐反向电压能力较弱,反向漏电流较大,防倒灌功能相对较弱。目前多采用MOS管作为理想二极管的主管,具有导通压降较小、低阻抗特性和防倒灌功能等优点。但由于MOS管栅极、源极之间的二氧化硅氧化层厚度通常在50~100 nm,栅极、源极耐电压能力受到一定的限制。为了确保 MOS管在正常工作条件下不会因电压过高而被击穿,会限制MOS管栅极、源极之间的最大电压,以此保证MOS管在正常工作条件下具有良好的电气性能和稳定性[3]。
高端理想二极管的实现方案采用“PMOS主管+ PNP对管[4]”或者“PMOS主管+PMOS对管[5-6]”,PMOS主管的栅极、源极耐反向电压能力较弱,PNP管基极与发射极间掺杂浓度很高,反向击穿PN结时的电压VEBO一般为几伏特,因此有必要研制具有耐高反向电压的高端理想二极管。
本文详细内容请下载:
https://www.chinaaet.com/resource/share/2000007181
投稿邮箱:ICAPP@belling.com.cn
作者信息:
陈石平,钱英军,朱冠良
(广东科贸职业学院智能制造学院,广东广州510430)

此内容为AET网站原创,未经授权禁止转载。
